化学气相沉积耐磨涂层TiN的温度选择

Selection of Temperature for Chemical Vapor Deposition of Wear-Resistance TiN Films

  • 摘要: 化学气相沉积(CVD)TiN涂层在模具上涂复3~10μm可使模具寿命提高3~4倍。本文研究指出:沉积温度对沉积速率、涂层硬度及对基体Cr12MoV硬度和尺寸都有影响。在950~1000℃间可以得到接近化学计量的TiN,其硬度Hv1≈20000N/mm2,基体尺寸变化在万分之五以内。

     

    Abstract: The effects of the deposition temperature on the chemical vapor deposition (CVD) rate, the bulk hardness value of TiN deposite and the hardness and the dimension of the steel base were investigated. TiN film obtained at temperatures between 950 and 1000℃, were stoichiometric composition, golden-yellow in color, and the high hardness (Hv1≈2000N/mm2). The hardness and dimension of the steel base depend on the deposition temperature. The variety of dimension for the steel base is less than 0.0005 if it is tempered after deposition.

     

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