铝阳极氧化膜二次阳极电解沉积MoS2
Electrodepositied MoS2 in the Pores of Anodic Films on Aluminium
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摘要: 观察了实验条件对恒电流密度下二次阳极处理电解沉积MoS2对应的电压时间关系曲线和膜颜色的影响。电子探针分析表明,沉积的固体润滑剂在整个孔的深度范围存在,但接近孔口的膜外表面下含量较高。透射电镜观察发现二次阳极处理过程实质上为二次阳极氧化过程,膜的阻挡层增厚,其厚度与电压的比值在1.0~1.4nm/V范围。原多孔膜底部未发生对应高电压的大孔的起源和发展。沉积MoS2的工艺使膜的硬度有所下降。膜的摩擦系数降低,耐磨性提高。Abstract: The factors affecting the voltage-time transients of anodic electro-deposition of porous anodic films on aluminium in (NH4)2MoS4 solution at various constant current densities have been studied. EPMA analyses reveal that the deposited solid lubricant distributes in the whole pore profile and has higher content in the region near the outer surface of the film. It is suggested that the DC anodic deposition process is a reanodizing process. The thickness of barrier layer increases with the rise of the voltage during reanodizing. The ratio between the thickness of barrier layer and the applied voltage is in the range of 1.0~1.4nm/V. No initiation of larger pores and cells corresponding to the higher voltage was found in the newly developed barrier layer. The films with MoS2 deposition have lower friction coefficent and higher wear resistance, but its hardness is lowered.