磁控溅射类金刚石碳膜的显微硬度
Microhardness of Magnetron Sputtered Diamond-like Thin Carbon Films
-
摘要: 采用显微硬度测试方法,研究在单晶硅衬底上沉积厚度仅为0.09-0.56μm的磁控溅射类金刚石碳膜的力学性能。结果表明,溅射碳膜的硬度随溅射工艺参数呈规律性变化,且可以和碳膜的类金刚石性质以及碳膜结构的SP3和SP2成分的变化相联系。采用Johnson复合硬度模型进行的分析表明,溅射碳膜的真实硬度在HV6000-6600之间,比天然金刚石的硬度略低。溅射类金刚石碳膜具有明显的压痕尺寸效应(ISE),其指数约为m=1.9。Abstract: Conventional microhardness test were employed to characterize the mechanical properties of magnetron sputtered diamond-like carbon thin films of thickness of 0.09-0.56 mirons. It was found that microhardness of magnetron sputtered DLC varies with sputtering parameters in a systematic way and it can be related to the diamond-like properties and the component of SP2 and SP3 structures of the DLC. Analysis from DLC of 0.3073μm which were simu-taneously sputtered onto stainless steel and single crystal silicon substrate at 200W showed that the true hardness of the DLC was ranging between HV 6000-6600, which is close to the hardness of natural diamond. Pronounced indentation size effect (ISE) was observed, and the ISE index of 1.9 for the DLC was obluined.