由氨解法制备的Si<sub>3</sub>N<sub>4</sub>粉末的表面元素状态

由氨解法制备的Si₃N₄粉末的表面元素状态

摘要: 用XPS表面分析,研究了由氨解法在不同温度下热解所得的Si₃N₄粉末,并与由硅粉氮化所得的商用Si₃N₄粉末作了比较。由氨解法制备的Si₃N₄粉末其表面存在两种状态的氧:结合状态的氧和吸附态的氧,其表面组成为Si_2.2-2.7N_2.9-3.7O。由硅粉氮化所制得Si₃N₄其表面也存在两种状态的氧,其表面组成则为Si_0.8N_0.8O。

Abstract: Si₃N₄ powders made from imide process and thermal decomposed at different temperatures have investigated by XPS surface analysis; They were compared with a commercial Si₃N₄ powder made with nitridation process. Oxygen both in combined form of Si_2.2-2.7N_2.9-3.7O layer and absorbed form were found on the powder surface, in contrast to Si_0.8 N_0.8O layer and absorbed form in the case of Si₃N₄ powders made from Si aitridation.