硅在铝晶界上的析出与非平衡偏聚
Preciptaion and Non-Equilibrium Segregation of Silicon at Grain Boundaries of Aluminum
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摘要: 经高温固溶处理后匀速冷却的Al-0.35%Si合金样品,晶界上可观察到富硅的析出相,析出量随着固溶处理温度的增加而增加。对于高温固溶处理,再在较低温度二次固溶处理不同时间后匀速冷却的样品,25min的晶界析出量最大;对于25min二次处理后直接水淬样品,晶界上可观察到1μm以上的析出相。实验结果表明,硅在铝界上存在着硅-空位复合体导致的非平衡偏聚。Abstract: At the grain boundaries of Al-0.35%Si alloy samples which are treated at high solution treatment temperature followed by uniform cooling, the Si-rich precipitates could be found, and the relative amounts of precipitates increased with the increasing of solution treatment temperature. For the samples which are firstly treated at higher solution temperatures and then treated at lower solution temperature followed by uniform cooling, the amount of precipitates is the maxinum for 25min. For the sample treated for 25min at lower temperature followed by water quench, precipitates which are larger than 1μm could be observed at grain boundaries. The above results show that non-equilibrium segregation of silicon exists at the grain boundary of aluminum.