大面积金刚石膜生长环境气氛的计算机模拟

基金项目:

国家“863”高科技资助项目(No.715-002-Z030)

详细信息

Thermal Stress Analysis of Large Area Diamond Films

摘要: 建立了直流电弧等离子体喷射ＣＶＤ大面积金刚石沉积数学模型．对衬底上方等离子体中的化学环境进行了模拟计算，并与在相同条件下对等离子体的光谱结果进行对比，发现计算结果与实验结果基本上吻合．在模拟条件下ＣＨ基团可能是促使金刚石生长的主要活化基因．模拟结果显示ＣＨ基因沿径向的均匀分布对大面积金刚石膜生长有较大的意义．
- 数学模型 /
- 金刚石膜 /
- 大面积 /
- 直流电弧等离子体喷射
Abstract: Numerical model for large area diamond film deposition by DC Arc Plasma Jet CVD method is proposed. Chemical environment over the substrate surface during diamond growth were calculated, and was compared with experiment data from optical emission spectrum obtained at similar conditions. It was found that the CH radical may be main active precursor responsible for diamond growth. The overall uniform distribution of CH radical is important for large area deposition of diamond films.
- numerical model /
- diamond film deposition /
- large area /
- DC Arc Plasma Jet