基体温度对碳氮薄膜成分和结构的影响

Effect of Substrate Temperature on the Composition and Structure of Carbon Nitride Thin Films

摘要: 采用微波等离子体化学气相沉积法,N₂/CH₄作反应气体,在Si(100)基体上沉积β-C₃N₄化合物.使用X射线光电子能谱(XPS)研究了基体温度对碳氮薄膜的成分和结构的影响,结果表明:随着温度的提高,N/C原子比迅速提高,α-和β-C₃N₄在薄膜中的比例随之提高,超过一定的温度后,N/C原子比将会降低.傅立叶变换红外光谱(FT-IR)和喇曼(Raman)谱结果支持C-N键的存在.

Abstract: The carbon nitride thin films have been prepared on Si substrates, using N,/CH. as reactive gases, by microwave chemical vapor deposition method. The effect of substrate temperature on the composition and structure of carbon nitride thin films were studied by X-ray photoelectron spectroscopy (XPS). As the substrate temperature increased, the N/C atomic ratios increased rapidly first and then decreased a little after a crucial temperature. Fourier transform infrared (FT-IR) and Raman spectra support the existence of C-N covalent bond.