大面积CVD金刚石膜的热铁板抛光
Thermo-Chemical Polishing of Large Area CVD Diamond Films
-
摘要: 研制成功国内第1台大面积CVD金刚石膜热铁板抛光机.它可以在10-3Pa真空条件下,加热到1 100℃;抛光台可以在0~10 r/min间实现无级调速,一次完成3片φ110 mm的金刚石膜的抛光.金刚石膜在980℃,2 h抛光的结果表明该装置有良好的抛光效果.金刚石膜在980℃抛光不同时间的Raman谱表明,金刚石热铁板抛光是金刚石石墨化和C原子不断扩散的过程.Abstract: The first domestic thermo-chemical polishing apparatus is setup. Three φl10 mm in diameter diamond films can be polished simultaneously at 10-3Pa from 750℃ to 100℃, with the polishing rate increasing with increasing temperature. The results of polishing at 980℃ showed that polishing of CVD diamond films is very efficient. Thermo-chemical polishing mechanism is based on the transformation of diamond into graphite and the atomic dissolution of carbon into a hot metal.