Ta种子层厚度及溅射速率对Ta/Ni<sub>65</sub>Co<sub>35</sub>双层膜各向异性磁电阻和矫顽力的影响

Ta种子层厚度及溅射速率对Ta/Ni₆₅Co₃₅双层膜各向异性磁电阻和矫顽力的影响

摘要: 研究了Ta种子层的厚度、溅射速率对Ta/Ni₆₅Co₃₅双层膜各向异性磁电阻值(△ρ/ρ)、矫顽力和织构的影响.研究表明,适当的Ta层厚度和较高的Ta层溅射速率对提高Ta/Ni₆₅Co₃₅双层膜的△ρ/ρ是有效的.Ta种子层的使用增大了Ta/Ni₆₅Co₃₅双层膜的矫顽力而其溅射速率对Ta/Ni₆₅Co₃₅双层膜矫顽力的影响很小.

Abstract: The effects of the thickness and deposition rate of Ta seed layer on the anisotropic magnetoresistance (AMP.) and coercivity ofTa/Ni₆₅Co₃₅ bilayers were investigated. The results showed that △ρ/ρ of Ta/Ni₆₅Co₃₅ bilayers could be improved at a certain thickness or higher deposition rate. The coercivity of Ta/Ni₆₅Co₃₅ films increased with the use of Ta seed layer. But the effect of the deposition rate on the coercivity of Ta/Ni₆₅Co₃₅ films was not significant.