二硫化钼二维结构材料:制备与应用

Two-dimensional molybdenum disulfide materials: Preparation and applications

  • 摘要: 石墨烯的成功揭示了二维材料的巨大潜力,但其固有的零带隙限制了其在器件领域的应用,从而推动研究转向具备天然带隙的过渡金属硫族化合物。二硫化钼(MoS2)作为该体系中的典型代表,以其稳定的半导体特性和优异的光电响应,成为类石墨烯二维半导体研究的核心模型。本文系统综述了MoS2从块体到单层、少层结构的各类制备方法,涵盖自上而下剥离与自下而上合成技术,并深入探讨了其在光电器件、能源存储与转换、传感和生物医学等关键领域的应用进展。最后,总结了当前MoS2研究面临的主要挑战,并对未来发展方向与应用前景进行了展望。

     

    Abstract: The success of graphene has revealed the great potential of two-dimensional materials, but its inherent zero bandgap limits its application in device fields, thus driving research towards transition metal dichalcogenides with natural bandgaps. Molybdenum disulfide (MoS2), as a typical representative in this system, has become a core model for graphene-like two-dimensional semiconductor research due to its stable semiconductor properties and excellent photoelectric response. This paper systematically reviews various preparation methods of MoS2 from bulk to monolayer and few-layer structures, covering top-down exfoliation and bottom-up synthesis techniques, and deeply explores its application progress in key fields such as optoelectronic devices, energy storage and conversion, sensing, and biomedicine. Finally, it summarizes the main challenges currently faced in MoS2 research and looks forward to future development directions and application prospects.

     

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