Li Huidong, Duan Shuzhen, Zhang Xin. Chromium Electroplating Using Reduced Product of Hexavalent Chromium[J]. Chinese Journal of Engineering, 1993, 15(6): 614-618. DOI: 10.13374/j.issn1001-053x.1993.06.014
Citation: Li Huidong, Duan Shuzhen, Zhang Xin. Chromium Electroplating Using Reduced Product of Hexavalent Chromium[J]. Chinese Journal of Engineering, 1993, 15(6): 614-618. DOI: 10.13374/j.issn1001-053x.1993.06.014
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Chromium Electroplating Using Reduced Product of Hexavalent Chromium

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  • Effects of different reducers as well as various reaction conditions on reducing of hexavalent chromium were investigated. The reaction process was discussed and the optimum reaction conditions were determined. The reaction product can serve as chromium source of nontoxic chromium plating and coating thicker than 100μm was obtained.
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