Volume 29 Issue 11
Aug.  2021
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NIU Decao, LI Chengming, LIU Zheng, GUO Shibin, LV Fanxiu. Growth stability and quality of plasma jet CVD diamond films under gas recycling condition[J]. Chinese Journal of Engineering, 2007, 29(11): 1133-1137. DOI: 10.13374/j.issn1001-053x.2007.11.001
Citation: NIU Decao, LI Chengming, LIU Zheng, GUO Shibin, LV Fanxiu. Growth stability and quality of plasma jet CVD diamond films under gas recycling condition[J]. Chinese Journal of Engineering, 2007, 29(11): 1133-1137. DOI: 10.13374/j.issn1001-053x.2007.11.001

Growth stability and quality of plasma jet CVD diamond films under gas recycling condition

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  • Received Date: July 24, 2006
  • Revised Date: September 04, 2006
  • Available Online: August 15, 2021
  • A mixture of H2, CH4 and Ar gas was used as feed gas under gas recycling condition. Diamond films with different thicknesses were deposited on molybdenum substrates by a 100 kW DC arc plasma jet CVD system at 850 and 950℃. The morphology, quality, orientation and residual stress of diamond films were analyzed by scanning electron microscopy (SEM), X-ray diffraction (XRD) and Raman spectroscopy. The results show that the quality of diamond films increases and the residual stress in diamond films decreases with increasing film thickness at 850℃. Diamond films with good growth stability were obtained and the tensile residual stress in diamond films was observed. The diamond film of 110μm in thickness deposited at 850℃ has a better growth stability, a higher quality and a smaller residual stress than the diamond film of 120 μm in thickness deposited at 950℃ when the flow rate of reaction gases is kept unchanged.
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